Analysis of hydrogen plasma in a microwave plasma chemical vapor deposition reactor

作者：Shivkumar G; Tholeti S S; Alrefae M A; Fisher T S; Alexeenko A A^*

来源：Journal of Applied Physics, 2016, 119(11): 113301.

DOI：10.1063/1.4943025

The aim of this work is to build a numerical model of hydrogen plasma inside a microwave plasma chemical vapor deposition system. This model will help in understanding and optimizing the conditions for the growth of carbon nanostructures. A 2D axisymmetric model of the system is implemented using the finite element high frequency Maxwell solver and the heat transfer solver in COMSOL Multiphysics. The system is modeled to study variation in parameters with reactor geometry, microwave power, and gas pressure. The results are compared with experimental measurements from the Q-branch of the H-2 Fulcher band of hydrogen using an optical emission spectroscopy technique. The parameter gamma in Funer's model is calibrated to match experimental observations at a power of 500 W and 30 Torr. Good agreement is found between the modeling and experimental results for a wide range of powers and pressures. The gas temperature exhibits a weak dependence on power and a strong dependence on gas pressure. The inclusion of a vertical dielectric pillar that concentrates the plasma increases the maximum electron temperature by 70%, the maximum gas temperature by 50%, and the maximum electron number density by 70% when compared to conditions without the pillar at 500 W and 30 Torr. Experimental observations also indicate intensified plasma with the inclusion of a pillar.

• 出版日期2016-3-21