A model of plasma source ion implantation for inner surface modification

作者:Sun M*; Zhu P; Yang SZ
来源:Journal of Physics D: Applied Physics , 1996, 29(1): 274-276.
DOI:10.1088/0022-3727/29/1/042

摘要

A model has been developed that describes the propagation of the transient sheath which forms inside a cylindrical target immersed in a plasma for inner surface implantation. Following this model, a differential equation and its integrated solution are obtained for the sheath-edge position as a function of time. This result can be used to predict the final sheath extent during each pulse for inner surface implantation of a cylindrical target.