摘要
Nanoscale cobalt-copper multilayers prepared by pulsed laser deposition on oxidized silicon substrate were investigated by means of transmission electron microscopic (TEM) methods combined with energy dispersive X-ray spectroscopy. The multilayers proved to be polycrystalline with grain sizes between some nanometers and the stack thickness. The topmost copper layer was incomplete with droplets up to 1 mu m. For single layer thicknesses greater than 4 nm it could be shown that the structure of the layer stacks was face centred cubic with hexagonal close packed parts in the cobalt layers.
- 出版日期1999-10