Deposition and characterization of silicon-aluminum non-conductive vacuum metallization coatings

作者：Tung, Huan Chien; Yang, Sidney S; Chang, Liuwen^*

来源：Materials Letters, 2014, 131: 161-163.

DOI：10.1016/j.matlet.2014.05.180

• Si-Al
• Thin films
• Non-conductive
• Vacuum metallization
• Particles, nanosize
• Sputtering

This study has examined the microstructure, electrical and optical properties of Si-Al thin films that have an Al content of 15-50 wt% and can be used as non-conductive vacuum metallization coatings. The films were magnetron sputtered using composite targets at ambient temperatures. A dual-phase microstructure composed of nano-sized Al particles dispersed in an amorphous Si matrix was obtained. The Si-Al films exhibited a high reflectance of 70-80% in the visible region and a high electric resistivity of 25-1000 Omega cm at Al content of 15-30 wt%.

• 出版日期2014-9-15
• 单位中山大学