Annealing effects on properties of LaB6/ATO thin films deposited by magnetron sputtering

作者：Wang Wei; Yuan Yifei; Zhang Lin; Min Guanghui^*

来源：Ceramics International, 2012, 38(5): 4313-4318.

DOI：10.1016/j.ceramint.2012.02.012

• Films
• Optical properties
• Magnetron sputtering

A series of LaB6/ATO films were deposited by magnetron sputtering at room temperature with the same deposition parameters. After deposition, the films were annealed at 400 degrees C, 700 degrees C and 1000 degrees C, respectively. The structure, morphology and opto-electrical characteristics of films were studied. It was found that the temperature for primary nucleation of LaB6 films was about 700 degrees C. The crystallinity and transmissivity increased with increasing annealing temperature. After annealing at 1000 degrees C, the films exhibited a much higher transmissivity in the visible region than in the near-infrared area. However, the resistivity increased by one order of magnitude after heat treatment and the films without annealing presented the best electrical property.

• 出版日期2012-7
• 单位山东大学