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摘要
Chlorine nanolayers can be modified by extreme UV (EUV) irradiation, which can be applied to the fabrication of various surface functional-group patterns (see igure) owing to the striking contrast in reactivity between EUV-exposed and -unexposed regions. The technique provides flexibility of surface functionalization and may be applicable to the manufacture of electronic, photonic, and biomolecular nanodevices.
- 出版日期2007-5-21
