Depth Profile Analysis of Amorphous Silicon Thin Film Solar Cells by Pulsed Radiofrequency Glow Discharge Time of Flight Mass Spectrometry

作者：Alvarez Toral Aitor; Sanchez Pascal; Menendez Armando; Pereiro Rosario^*; Sanz Medel Alfredo; Fernandez Beatriz

来源：Journal of the American Society for Mass Spectrometry, 2015, 26(2): 305-314.

DOI：10.1007/s13361-014-1022-9

• Pulsed glow discharge
• Time of flight mass spectrometry
• Multimatrix calibration
• Depth profiling
• Amorphous silicon thin film solar cells

Among the different solar cell technologies, amorphous silicon (a-Si:H) thin film solar cells (TFSCs) are today very promising and, so, TFSCs analytical characterization for quality control issues is increasingly demanding. In this line, depth profile analysis of a-Si:H TFSCs on steel substrate has been investigated by using pulsed radiofrequency glow discharge-time of flight mass spectrometry (rf-PGD-TOFMS). First, to discriminate potential polyatomic interferences for several analytes (e.g., Si-28(+), P-31(+), and O-16(+)) appropriate time positions along the GD pulse profile were selected. A multi-matrix calibration approach, using homogeneous certified reference materials without hydrogen as well as coated laboratory-made standards containing hydrogen, was employed for the methodological calibration. Different calibration strategies (in terms of time interval selection on the pulse profile within the afterglow region) have been compared, searching for optimal calibration graphs correlation. Results showed that reliable and fast quantitative depth profile analysis of a-Si:H TFSCs by rf-PGD-TOFMS can be achieved.

• 出版日期2015-2