Absolute cross section for loss of supercoiled topology induced by 10 eV electrons in highly uniform/DNA/1,3-diaminopropane films deposited on highly ordered pyrolitic graphite

作者：Boulanouar Omar; Fromm Michel; Bass Andrew D^*; Cloutier Pierre; Sanche Leon

来源：Journal of Chemical Physics, 2013, 139(5): 055104.

DOI：10.1063/1.4817323

It was recently shown that the affinity of doubly charged, 1-3 diaminopropane (Dap(2+)) for DNA permits the growth on highly ordered pyrolitic graphite (HOPG) substrates, of plasmid DNA films, of known uniform thickness [O. Boulanouar, A. Khatyr, G. Herlem, F. Palmino, L. Sanche, and M. Fromm, J. Phys. Chem. C 115, 21291-21298 (2011)]. Post-irradiation analysis by electrophoresis of such targets confirms that electron impact at 10 eV produces a maximum in the yield of single strand breaks that can be associated with the formation of a DNA-transient anion. Using a well-adapted deterministic survival model for the variation of electron damage with fluence and film thickness, we have determined an absolute cross section for strand-break damage by 10 eV electrons and inelastic scattering attenuation length in DNA-Dap complex films.

• 出版日期2013-8-7
• 单位中国地震局