A low-noise silicon nitride nanopore device on a polymer substrate

作者：Choi Wook; Jeon Eun Seok; Chun Kyoung Yong; Kim Young Rok; Park Kyeong Beom; Kim Ki Bum; Han Chang Soo^*

来源：PLos One, 2018, 13(7): e0200831.

DOI：10.1371/journal.pone.0200831

We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

• 出版日期2018-7-20