Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser

作者：Hau Riege Stefan P^*; London Richard A; Bionta Richard M; Soufli Regina; Ryutov Dmitri; Shirk Michael; Baker Sherry L; Smith Patrick M; Nataraj Pradeep

来源：Applied Physics Letters, 2008, 93(20): 201105.

DOI：10.1063/1.3021081

• boron compounds
• elemental semiconductors
• free electron lasers
• laser beam effects
• silicon
• ultraviolet radiation effects
• X-ray optics

Optical elements to be used for x-ray free electron lasers (XFELs) must withstand multiple high-fluence pulses. We have used an ultraviolet laser to study the damage of two candidate materials, crystalline Si and B(4)C-coated Si, emulating the temperature profile expected to occur in optics exposed to XFEL pulses. We found that the damage threshold for 10(5) pulses is similar to 20% to 70% lower than the melting threshold.

• 出版日期2008-11-17