Analysis of Ti and TiO2 nanolayers by total reflection X-ray photoelectron spectroscopy

作者：Kubala Kukus A; Banas D; Stabrawa I; Szary K; Sobota D; Majewska U; Wudarczyk Mocko J; Braziewicz J; Pajek M

来源：Spectrochimica Acta Part B: Atomic Spectroscopy , 2018, 145: 43-50.

DOI：10.1016/j.sab.2018.03.012

• Total reflection X-ray photoelectron spectroscopy (TRXPS)
• Ti nanolayer
• TiO2 nanolayer
• Highly charged slow Xe ions implantation
• TRXPS detection limit

Total reflection X-ray photoelectron spectroscopy (TRXPS) is applied in the analysis of Ti and TiO2 nanolayers deposited on silicon and silicon dioxide substrates. The idea of application of total-reflection phenomenon for exciting X-ray used in the XPS technique is briefly discussed. The experimental setup and measurement conditions for the studied Ti and TiO2 layers are presented. The XPS spectra were registered both for the non-total and total reflection regimes. The survey spectra and C1s, N1s, Ti2p and O1s photoelectron peaks are shown. For energy calibration, the position of C1s photoelectron peak was applied (C-C component, binding energy 284.8 eV). The peak to background ratios are discussed as regards the dependence of the excitation angle. An increase of this ratio for the glancing angle 1 degrees, being below critical angle of the X-ray beam and sample material, results in an improvement of XPS detection limit by factor up to 2. In the case of the Ti nanolayer, additionally, the thickness of the overlayer TiO2 is determined. As an example of applying the TRXPS technique, the analysis of Ti nanolayers implanted by highly charged Xe35+ ions of 280 keV energy is discussed. The Xe3d and O1s photoelectron peaks are presented and discussed.

• 出版日期2018-7