A dedicated multilayer technique for the fabrication of three-dimensional metallic nanoparticles

作者：Helgert C^*; Dietrich K; Lehr D; Kaesebier T; Pertsch T; Kley E B

来源：Microelectronic Engineering, 2012, 97: 181-184.

DOI：10.1016/j.mee.2012.03.021

• Nanostructure fabrication technology
• Electron beam lithography
• Dry etching
• Three-dimensional
• Nanoparticle
• Metamaterial
• Optical properties

High resolution electron-beam lithography has been applied to the fabrication of three-dimensional metallic nanostructures. The herein developed fabrication process, which is demonstrated at the example of two ensembles of complex nanoscale particles, comprises a dedicated combination of multilayer electron-beam exposure, vacuum evaporation, lift-off and dry etching. The designs of the two nanostructures rely on the principles of a low degree of spatial symmetry and a high degree of chirality, respectively. Their optical properties are evaluated by means of far-field transmittance spectroscopy. Our fabrication technique delivers an excellent quality of miniaturized three-dimensional nanostructures and yields great potential to be extended towards the fabrication of large-area optical metamaterials composed of truly three-dimensional metallic nanoparticles.

• 出版日期2012-9