Development of Directed Self-Assembly Materials for Sub 10 nm Patterning

作者：Komatsu Hiroyuki^*; Hori Masafumi; Minegishi Shinya; Naruoka Takehiko; Nagai Tomoki

来源：Journal of Photopolymer Science and Technology, 2014, 27(4): 425-429.

DOI：10.2494/photopolymer.27.425

• Directed self-assembly
• anionic polymerization
• block copolymer
• high-chi

Directed self-assembly (DSA) technique has been focused as the novel semi-conductor manufacturing process replacing photo-lithography process for semi-conductor applications. We synthesize block copolymers (BCP) containing silicon unit, which show cylinder and lamellae structure from micro-phase separation by only heat annealing (220 degrees C/60 sec). Moreover, we could get hexagonal cylinder, maybe lamella structure along the guide pattern for pattern division by grapho-epitaxy. The examined BCPs are expected to be promising materials for sub 10 nmhP patterning.

• 出版日期2014