科研之友
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摘要
A digital, direct nanoscale metal patterning method is developed using femtosecond laser digital processing of metal nanoparticles for nanoscale electronics fabrication without using conventional vacuum deposition or a photolithography mask. This method is expected to be a potential alternative to the conventional electron beam lithography method for arbitrary nanoscale direct patterning in single-step, low-temperature, and non-vacuum environments.
- 出版日期2011-7-26
