A comparative study of CrAlN films synthesized by dc and pulsed dc reactive magnetron facing target sputtering system with different pulse frequencies

作者：Khamseh S^*; Nose M; Kawabata T; Nagae T; Matsuda K; Ikeno S

来源：Journal of Alloys and Compounds, 2010, 508(1): 191-195.

DOI：10.1016/j.jallcom.2010.08.042

• CrAlN
• dc Magnetron sputtering
• Pulsed magnetron sputtering
• Pulse frequency
• Balanced magnetron sputtering

CrAlN films were prepared using a balanced magnetron sputtering system operated in dc and pulsed condition (with different pulse frequencies), and their phase composition were then determined through XRD analysis. In order to investigate the relationship between the mechanical properties and microstructure of the films, hardness measurements were taken using a nanoindentation system. All films exhibited NaCl-type CrN structure in both dc and pulsed conditions. Plastic hardness, H-pl, of the films ranged between 15 to 36 GPa. Pulsed prepared CrAlN films showed higher hardness, higher internal stress values, and smaller grain sizes than dc prepared CrAlN film. Moreover, plastic hardness and internal stress of pulsed prepared CrAlN films increased on increasing pulse frequency.

• 出版日期2010-10-15