Degradation of ciprofloxacin by UV/S2O82- process in a large photoreactor

作者:Lin Chia Chang*; Wu Min Shan
来源:Journal of Photochemistry and Photobiology A: Chemistry , 2014, 285: 1-6.
DOI:10.1016/j.jphotochem.2014.04.002

摘要

This study evaluates the effectiveness of the UV/S2O82- process in the degradation of ciprofloxacin in aqueous solutions without adjusting their pH using a large photoreactor. The effect of Na2S2O8 concentration on the efficiency of degradation of ciprofloxacin was examined. A larger Na2S2O8 concentration was associated with a higher efficiency of degradation of ciprofloxacin. However, excessive Na2S2O8 concentration inhibited the degradation of ciprofloxacin. UV/S2O82- process exhibited pseudo-first-order kinetics. SO4 center dot- was detected by performing quenching studies using specific alcohols, revealing that SO4 center dot- was found to be the predominant radical. Additionally, the presence of HCO3- inhibited the degradation of ciprofloxacin at a high concentration. An efficiency of degradation of ciprofloxacin was 95% within 30 min using an Na2S2O8 concentration of 1.92 g/L in the absence of inorganic anions. Comparison of both UV/S2O82- and heat/S2O82- processes demonstrates that the degradation of ciprofloxacin at ambient temperature can be enhanced by the UV/S2O82- process, leading to a reduced operating time. These promising results obviously reveal the potential of the UV/S2O82- process application for the effective degradation of ciprofloxacin in aqueous solutions without adjusting the pH.

  • 出版日期2014-7-1
  • 单位长春大学