摘要
A simple method entirely based on solution chemistry to deposit metals on foreign substrates at underpotential conditions is described. The method allows deposition of extremely small amounts of metals under equilibrium conditions. Thiolate-covered bimetallic extended planar and nanoparticle surfaces can be easily prepared by this route using redox couples and solution pH to control the interfacial potential of the system.
- 出版日期2007-7-5