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摘要
The random antireflective structures are modeled by the analysis of the random morphology distribution. According to the effective medium theory, the transmission of the antireflective structure is calculated by dividing the structure into multilayer, and the dependence on parameters of the subwavelength is analyzed in detail. In the single-variable condition, etching depth, half breadth of distribution, and median of distribution get a positive correlation with the transmittance where the etching depth plays a most important part in enhancing the transmittance, whereas the angle of structures gets a negative correlation. The experimental results coincide well with the calculation and analysis. The analysis offers a theory guidance to fabricate random subwavelength antireflected structures using metal dewetting.
- 出版日期2017-7
- 单位长春理工大学; 中国科学院重庆绿色智能技术研究院
