摘要

A Lohmann-type computer-generated hologram (CGH) is fabricated using an electron-beam lithographic system. A high-resolution groove width of 0.2 mu m is attained in relief gratings by changing the e-beam exposures. A diffraction efficiency close to similar to 30.4% is obtained by using resist-on-silicon recording materials and cell-structural apertures in a CGH. The reconstructed images exhibit fewer phase noises owing to the incorporation of a non-overflow cell structure into a CGH. The CGH is designed for reconstruction-noise reduction by using an iterative error-reduction algorithm. The designed CGH exhibits fewer reconstruction noises such that the performance function in the convergence is smaller by a factor of 1/3 than that in the first iteration. Experiments demonstrating the performance of CGHs obtained by electron-beam lithography are presented.

  • 出版日期2012-3