Antibacterial Cr-Cu-O films prepared by reactive magnetron sputtering

作者：Musil J^*; Blazek J; Fajfrlik K; Cerstvy R; Proksova S

来源：Applied Surface Science, 2013, 276: 660-666.

DOI：10.1016/j.apsusc.2013.03.150

• Cr-Cu-O film
• Structure
• Mechanical properties
• Antibacterial efficiency
• Reactive magnetron sputtering

The paper reports on the effect of Cu content in the Cr-Cu-O film and its structure on its antibacterial activity and mechanical properties. The Cr-Cu-O films were prepared by reactive magnetron sputtering from composed Cr/Cu targets using a dual magnetron. The antibacterial activity of Cr-Cu-O films was tested on the killing of Escheria coli bacteria. Correlations between the structure of the Cr-Cu-O film, the content of Cu in the film and its (i) antibacterial efficiency and (ii) mechanical properties were investigated in detail. It was found that the 100% efficiency of the killing of E. coli bacteria on the surface of the Cr-Cu-O film is achieved if (1) the Cu content in the film is %26gt;= 15 at.% and (2) the film is either X-ray amorphous or crystalline with the CuCrO2 delafossite structure. These Cr-Cu-O films need no excitation and very effectively kill E. coli bacteria in the daylight as well as in the dark. The X-ray amorphous Cr-Cu-O films with similar to 20 at.% Cu exhibit a higher (i) hardness H approximate to 4 GPa, (ii) effective Young%26apos;s modulus E* approximate to 72 GPa and (iii) elastic recovery We approximate to 37% compared with the crystalline Cr-Cu-O film with the CuCrO2 delafossite structure exhibiting H approximate to 1.2 GPa, E* approximate to 21 GPa and We approximate to 21%. Both films very effectively kill the E. coli bacteria, however, exhibit a low ratio H/E* %26lt;0.1.

• 出版日期2013-7-1