摘要

In this paper, multiple beams surface plasmon (SP) interference generation based on prism coupling technique is theoretically analyzed and presented. The proposed multiple beams SP interference configuration is investigated for nanolithography application for two-dimensional feature fabrication. The configuration is then numerically and experimentally analyzed by employing aluminum metal at 364-nm illumination wavelengths to realize high resolution and high aspect ratio two-dimensional periodic nanoscale dot array patterns on the recording medium.

  • 单位
    南阳理工学院