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摘要
A new technique, namely the digital rotation-mask technique for the fabrication of some diffractive microlenses with rotationally symmetric phase distribution, is presented in this paper. Using this technique, the mask pattern can be produced and rotated by computer. Then it is projected and imaged on the substrate coated with photoresist by the digital mask fabrication system based on a digital micromirror device (DMD). The desired exposure energy distribution can be obtained by using the computer to control the rotation speed and exposure time of the mask pattern. Simulative and experimental results testified that the technique is feasible. Compared with the mechanical rotation-mask technique, the digital rotation-mask technique avoids mechanical alignment error and machining error. In addition, the fabrication efficiency of the diffractive optical elements (DOEs) is promoted and the manufacturing cost will be reduced.
- 出版日期2008
