Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam

作者：Fox Daniel S; Zhou Yangbo; Maguire Pierce; O'Neill Arlene; O'Coileain Cormac; Gaten**y Riley; Glushenkov Alexey M; Tao Tao; Due**erg Georg S; Shvets Igor V; Abid Mohamed; Abid Mourad; Wu Han Chun; Chen Ying; Coleman Jonathan N; Donegan John F; Zhang Hongzhou^*

来源：Nano Letters, 2015, 15(8): 5307-5313.

DOI：10.1021/acs.nanolett.5b01673

• Helium ion beam
• nanopatterning
• MoS2
• stoichiometry
• nanoribbon
• electrical tuning

We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He+. Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.

• 出版日期2015-8
• 单位北京理工大学