Deposition of Fluorocarbon Nanoclusters by Gas Aggregation Cluster Source

作者：Drabik Martin^*; Serov Anton; Kylian Ondrej; Choukourov Andrei; Artemenko Anna; Kousal Jaroslav; Polonskyi Oleksandr; Biederman Hynek

来源：Plasma Processes and Polymers, 2012, 9(4): 390-397.

DOI：10.1002/ppap.201100147

• gas aggregation cluster source
• nanocluster
• nanostructures
• PTFE
• super-hydrophobic

Gas aggregation cluster source based on planar magnetron was used for deposition of fluorocarbon nanocluster films. The films possess a high roughness with a size of nanoclusters estimated to be about 30?nm in average. Their chemical structure was found to resemble that of a conventional bulk polytetrafluoroethylene which was confirmed by X-ray photoelectron spectroscopy and Fourier-transform infrared spectroscopy. The fluorine to carbon elemental ratio was found to be 1.95 with 86% of CF2 structural units. The deposited films revealed super-hydrophobic character with values of water contact angle reaching over 170 degrees.

• 出版日期2012-4