Antireflection and downconversion response of Nd3+ doped Y2O3/Si thin film deposited by AACVD process

作者：Elleuch R^*; Salhi R; Deschanvres J L; Maalej R

来源：Chemical Physics Letters, 2014, 612: 1-7.

DOI：10.1016/j.cplett.2014.07.007

Nd3+:Y2O3 nanograins-like structure films with various Nd concentrations, were deposited on Si (1 0 0) substrates by aerosol assisted chemical vapor deposition (AACVD) process. The intense 900 mm emission of Nd3+ corresponding to the F-4(3/2) -> I-4(9/2) transition was investigated as a function of the annealing temperature. The reflectance percentage of the optimized 5 mol.% Nd:Y2O3 film was recorded at about 16% in 400-1000 nm range. The refractive index (n=1.94) and the low porosity (P=2.74%) showed the high transparency of this film. The obtained results demonstrate that this film can enhance the Si solar cell efficiency by light trapping and spectrum shifting.

• 出版日期2014-9-18