Deposition of TiN coatings on shape memory NiTi alloy by plasma immersion ion implantation and deposition

作者：Cheng Y; Zheng Y F^*

来源：Thin Solid Films, 2006, 515(4): 1358-1363.

DOI：10.1016/j.tsf.2006.03.041

• titanium nitride
• nickel titanium ally
• plasma immersion ion implantation and deposition
• hardness

An investigation has been carried out to study the effect of pulse negative bias voltage on the morphology, microstructure, mechanical, adhesive and tribological properties of TiN coatings deposited on NiTi substrate by plasma immersion ion implantation and deposition. The surface morphologies were relatively smooth and uniform with lower root mean square values for the samples deposited at 15 W and 20 W negative bias voltages. X-ray diffraction results demonstrated that the pulse negative bias voltage can significantly change the microstructure of TiN coatings. The intensity of TiN(220) peak increased with the increase of negative bias voltage in the range of 5-20 W. When the negative bias voltage increased to 30 W, the preferred orientation was TiN(200). Nanoindentation test indicates that hardness and elastic modulus increased with the increase of the negative bias voltage (5 W, 15 W and 20 W), and then dropped sharply at 30 W The adhesion between the TiN and NiTi alloy and tribological properties of TiN coated NiTi alloy depend strongly on the bias voltage parameter; the sample deposited at 20 W possesses good adhesion strength and excellent tribological property.

• 出版日期2006-12-5
• 单位北京大学