Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process

作者：Siliprandi Riccardo A; Zanini Stefano; Grimoldi Elisa; Fumagalli Francesco S; Barni Ruggero^*; Riccardi Claudia

来源：Plasma Chemistry and Plasma Processing, 2011, 31(2): 353-372.

DOI：10.1007/s11090-011-9286-3

• Plasma-enhanced chemical vapour deposition
• Hexamethyldisiloxane
• Polysiloxane
• Dielectric barrier discharge
• Low pressure glow discharge

An atmospheric pressure dielectric barrier plasma discharge has been used to study a thin film deposition process. The DBD device is enclosed in a vacuum chamber and one of the electrodes is a rotating cylinder. Thus, this device is able to simulate continuous processing in arbitrary deposition condition of pressure and atmosphere composition. A deposition process of thin organosilicon films has been studied reproducing a nitrogen atmosphere with small admixtures of hexamethyldisiloxane (HMDSO) vapours. The plasma discharge has been characterized with optical emission spectroscopy and voltage-current measurements. Thin films chemical composition and morphology have been characterized with FTIR spectroscopy, atomic force microscopy (AFM) and contact angle measurements. A strong dependency of deposit character from the HMDSO concentration has been found and then compared with the same dependency of a typical low pressure plasma enhanced chemical vapour deposition process.

• 出版日期2011-4