Study of the effects of E x B fields as mechanism to carbon-nitrogen plasma immersion ion implantation on stainless steel samples

作者：Pillaca E J D M^*; Ueda M; Oliveira R M; Pichon L

来源：Applied Surface Science, 2014, 310: 300-304.

DOI：10.1016/j.apsusc.2014.04.003

• PIII with magnetic field
• Carbon-nitrogen ion implantation
• Magnetic mirror geometry
• Crossed E x B fields

Effects of E x B fields as mechanism to carbon nitrogen plasma immersion ion implantation (PIII) have been investigated. This magnetic configuration when used in PIII allows obtaining high nitrogen plasma density close to the ion implantation region. Consequently, high ions dose on the target is possible to be achieved compared with standard Pill. In this scenario, nitrogen and carbon ions were implanted simultaneously on stainless steel, as measured by GDOES and detected by X-ray diffraction. Carbon-tape disposed on the sample-holder was sputtered by intense bombardment of nitrogen ions, being the source of carbon atoms in this experiment. The implantation of both N and C caused changes on sample morphology and improvement of the tribological properties of the stainless steel.