Bond and electrochromic properties of WO3 films deposited with horizontal DC, pulsed DC, and RF sputtering

作者：Chen Hsi Chao^*; Jan Der Jun; Chen Chien Han; Huang Kuo Ting

来源：Electrochimica Acta, 2013, 93: 307-313.

DOI：10.1016/j.electacta.2013.01.094

• Electrochromism
• Tungsten oxide (WO3)
• Pulsed DC sputtering
• Radio frequency (RF) sputtering
• Cyclic voltammograms (CVs)

The purpose of this research was to investigate the bond and electrochromic properties of tungsten oxide (WO3) thin films deposited by three different plasmas sources: direct current (DC), pulsed DC and radio frequency (RF). The experimental results show that optical intensity increases with an increasing oxygen percentage and that all films have a 950 cm(-1) peak which results in a bond of W6+=O in the Raman spectra. Hence, the oxygen percentage was changed from 0.3 to 0.7 to study the influence of coloring and bleaching as regards the different sputtering powers. Additionally, WO3 thin films show the best electrochromic properties as regards the oxygen/argon (O-2/Ar) gas ratios of 0.7, 0.6 and 0.6 for DC, pulsed DC and RF sputtering, respectively. The transmittances of all films are over 75% as-deposited, and the deposition rates were between 0.8 and 0.1 angstrom s(-1). Simultaneously, the transmittance variations (Delta T) were 51%, 57% and 53% for DC, pulsed DC and RF sputtering at a wavelength of 550 nm, respectively. The bleached/colored ability of the cyclic voltammograms (CVs) was pulsed DC > DC > RF.

• 出版日期2013-3-30