Directional Alignment of FeCo Crystallites in Si/NiFe/Ru/FeCoB Multi layer with High Anisotropy Field Above 500 Oe

作者：Hirata Ken ichiro; Gomi Shunsuke; Nakagawa Shigeki^*

来源：Journal of Nanoscience and Nanotechnology, 2011, 11(3): 2739-2742.

DOI：10.1166/jnn.2011.2711

• Magnetic Anisotropy
• Anisotropy Field
• Ru
• FeCoB
• Facing Targets Sputtering

In-plane magnetic anisotropy and crystal structure of FeCoB layer on Si/NiFe/Ru underlayer were investigated by using X-Ray Diffraction (XRD) measurement. A pole-figure measurement of XRD showed directionally tilted alignment of FeCo crystallites in Si/NiFe/Ru/FeCoB multilayered film with high in-plane anisotropy field H(k) but no directional alignment was found in FeCoB single layered film. The higher H(k) appeared in the Si/NiFe/Ru/FeCoB multilayered configuration with the thicker FeCoB layer. Since Ru crystallites in a multiunderlayer configuration exhibited no directional alignment, the surface structure of underlayer should be no main reason for the directional alignment of FeCo crystallites deposited on it. The dependence of hickness of FeCoB layer in Si/NiFe/Ru/FeCoB film on H(k) indicated that the in-plane magnetic anisotropy is caused by not only the structure of Ru underlayer but also oblique incidence effect of sputtered particles, which is attained in configuration of Facing Targets Sputtering (FTS) system. From these experimental results, remarkably high H(k) of 540 Oe was obtained.

• 出版日期2011-3