摘要

In this study, we develop a vacuum-assisted photo resist filling technology for micro-structures by integrating the characteristics of PDMS soft mold, photo cure resist, and vacuum equipment. Together with soft mold, this technology can be adopted in the production of optical waveguide components. Conformal contact can be achieved on the material surface with PDMS soft mold. Meanwhile, it has a low surface free energy and won't stick to the resist during the filling. By vacuum pumping, the resist filling will be compact and complete. It increases the effective filling area significantly.

  • 出版日期2008