A glance of technology efforts for design-for-manufacturing in nano-scale CMOS processes

作者：Cheng YuHua^*

来源：Science in China - Series F: Information Sciences , 2008, 51(6): 807-818.

DOI：10.1007/s11432-008-0054-9

• design-for-manufacturing (DFM)
• design-for-yield
• nano-CMOS IC design
• IC design methodology
• CMOS design technology platform

This paper overviews design for manufacturing (DFM) for IC design in nano-CMOS technologies. Process/device issues relevant to the manufacturability of ICs in advanced CMOS technologies will be presented first before an exploration on process/device modeling for DFM is done. The discussion also covers a brief introduction of DFM-aware of design flow and EDA efforts to better handle the design-manufacturing interface in very large scale IC design environment.

• 出版日期2008-6
• 单位北京大学