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Development of extremely low temperature processed oxide thin film transistors via atmospheric steam reforming treatment: Interface, surface, film curing

作者：Kang Won Jun; Ahn Cheol Hyoun; Kim Kyung Su; Jung Sung Hyeon; Cho Sung Woon; Cho Hyung Koun; Kim Yunseok
来源：Journal of Alloys and Compounds, 2018, 744: 23-33.
DOI：10.1016/j.jallcom.2018.02.028
  • 出版日期2018-5-5

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更新时间：2021-03-17 14:19