Optical design of Schwarzschild microscope for plasma diagnostics

作者：Huang Yi; Mu Baozhong^*; Wang Xin; Zhai Zirong; Yi Shengzhen; Wang Zhanshan

来源：High Power Laser and Particle Beams, 2011, 23(2): 397-402.

DOI：10.3788/HPLPB20112302.0397

• Current fabrication
• Curvature radii
• Field of views
• Imaging distances
• Imaging resolutions
• Laser plasma
• Numerical aperture
• Schwarzschild
• Spatial resolution
• Surface irregularities
• System assembly
• System tolerance
• Third order aberration theory
• Tolerance
• Tolerance factor

Based on the third order aberration theory, the optical system of an EUV Schwarzschild microscope is designed for laser plasma diagnostics. The microscope works at 18.2 nm with the numerical aperture of 0.1 and the magnification of 10. The optical system is optimized to achieve the spatial resolution of 0.3 μm in the center field and about 0.4 μm in the field of ±1 mm. The influences of Schwarzschild system tolerances are analyzed in the aspects of system assembly, alignment and components fabrication. The results show that the optics surface irregularity is the main factor affecting imaging resolution; by improving the accuracy of system alignment, the deterioration of resolution, resulting from imaging distance tolerance, and the spacing and the curvature radius tolerances of objectives, can be effectively compensated. The overall system tolerance is formulated with the comprehensive consideration of the current fabrication and alignment capabilities. With the addition of all the tolerance factors, the optical system obtains a spatial resolution of 3 μm in the field of ±1 mm, and can reach the requirements of laser plasma diagnosis.

• 出版日期2011
• 单位同济大学