Structure evolution of hydrogenated carbon films from amorphous carbon to fullerene-like nanostructure

作者：Wang Chengbing^*; Ling Xiaoming; Shi Jing; Xia Rongbin

来源：Surface and Interface Analysis, 2014, 46(8): 550-555.

DOI：10.1002/sia.5568

• amorphous carbon films
• PECVD
• tribology
• fullerene-like nanostructure

A-C: H (hydrogenated amorphous carbon) films were deposited by pulsed direct-current (d.c.) plasma enhanced chemical vapor deposition on silicon substrates. This study investigated the structural and mechanical evolution of the as-deposited films with fullerene-like nanostructure. The results showed that pulsed d.c. negative bias (-500 similar to -1000 V) signally influenced the growth rate, hardness, surface roughness, sp(3) content, and friction behavior of the films. As the pulsed d.c. negative bias voltage increased, the sp(3) content, surface roughness, hydrogen content and the friction coefficient of the films decreased; however, the growth rate and the hardness increased. The films deposited at -1000 V with fullerene-like microstructure display a nanohardness of about 19.7 GPa and the smallest friction coefficient (similar to 0.06). The evolution on mechanical and structural properties of the films are explained by the a-C:H growth mechanism based on the interaction on plasma-surface interface and the subsurface reactions in the film.

• 出版日期2014-8
• 单位兰州交通大学