Direct nanopatterning of 100 nm metal oxide periodic structures by Deep-UV immersion lithography

作者：Stehlin Fabrice; Bourgin Yannick; Spangenberg Arnaud; Jourlin Yves; Parriaux Olivier; Reynaud Stephanie; Wieder Fernand; Soppera Olivier^*

来源：Optics Letters, 2012, 37(22): 4651-4653.

DOI：10.1364/ol.37.004651

Deep-UV lithography using high-efficiency phase mask has been developed to print 100 nm period grating on sol-gel based thin layer. High efficiency phase mask has been designed to produce a high-contrast interferogram (periodic fringes) under water immersion conditions for 244 nm laser. The demonstration has been applied to a new developed immersion-compatible sol-gel layer. A sol-gel photoresist prepared from zirconium alkoxides caped with methacrylic acids was developed to achieve 50 nm resolution in a single step exposure. The nanostructures can be thermally annealed into ZrO2. Such route considerably simplifies the process for elaborating nanopatterned surfaces of transition metal oxides, and opens new routes for integrating materials of interest for applications in the field of photocatalysis, photovoltaic, optics, photonics or microelectronics.

• 出版日期2012-11-15