Size-dependent adhesion of nanopatterns for nanoimprint applications

作者：Kim Kwang Seop; Kim Ki Don; Jeong Jun Ho; Lee Hak Joo; Kim Jae Hyun^*

来源：Electronic Materials Letters, 2013, 9(6): 845-850.

DOI：10.1007/s13391-013-6027-1

• size-dependent adhesion
• nanopatterns
• nanoimprint lithography
• multi-scale

Adhesion characteristics are critical in nanoimprint lithography (NIL) because they govern the resulting pattern fidelity. These characteristics can be size dependent, which is an obstacle to fabricating multi-scale patterns. In this study, four types of nanopatterns were fabricated using NIL. All patterns had the same area density, but they had different pattern sizes. The measured adhesion between the NIL patterns and the stamps showed a strong dependence on the pattern size. Based on these results, we propose a multi-scale model that can be used to provide useful guidance for NIL multi-scale fabrication down to 60 nm. A design procedure for the NIL processing of multi-scale patterns is suggested based on the use of a microtribometer and the multi-scale model.

• 出版日期2013-11