摘要
A new single bath for the electrodeposition of ultrathin NiFe/Cu multilayers was developed and magnetoresistance measurements were conducted. Complementary methods such as scanning electron microscopy (SEM), x-ray diffraction (XRD) and transmission electron microscopy (TEM) were used to characterize the multilayers. Magnetoresistance measurements indicated that the multilayers grown from this new bath exhibited a giant magnetoresistance (GMR) behavior.
- 出版日期2012-2