A New Single Bath for the Electrodeposition of NiFe/Cu Multilayers Exhibiting Giant Magnetoresistance Behavior

作者:Esmaili S*; Bahrololoom M E
来源:Surface Engineering and Applied Electrochemistry, 2012, 48(1): 35-41.
DOI:10.3103/S106837551201005X

摘要

A new single bath for the electrodeposition of ultrathin NiFe/Cu multilayers was developed and magnetoresistance measurements were conducted. Complementary methods such as scanning electron microscopy (SEM), x-ray diffraction (XRD) and transmission electron microscopy (TEM) were used to characterize the multilayers. Magnetoresistance measurements indicated that the multilayers grown from this new bath exhibited a giant magnetoresistance (GMR) behavior.

  • 出版日期2012-2