Atomic layer deposited aluminum oxide barrier coatings for packaging materials

作者：Hirvikorpi Terhi; Vaha Nissi Mika^*; Mustonen Tuomas; Iiskola Eero; Karppinen Maarit

来源：Thin Solid Films, 2010, 518(10): 2654-2658.

DOI：10.1016/j.tsf.2009.08.025

• Atomic layer deposition
• Aluminum oxide
• Diffusion barriers
• Biodegradable polymers
• Polymers
• Packaging material

Thin aluminum oxide coatings have been deposited at a low temperature of 80 degrees C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al(2)O(3) coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.

• 出版日期2010-3-1