Deposition of osmium and ruthenium thin films from organometallic cluster precursors

作者：Li Chunxiang; Leong Weng Kee^*; Loh Kian Ping

来源：Applied Organometallic Chemistry, 2009, 23(5): 196-199.

DOI：10.1002/aoc.1494

• osmium
• ruthenium
• alloy
• cluster
• CVD

Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs(3)(CO)(13)(mu-H)(2) have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively.

• 出版日期2009-5
• 单位南阳理工学院