Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography

作者：Katsumata Reika; Yogeesh Maruthi Nagavalli; Wong Helen; Zhou Sunshine X; Sirard Stephen M; Huang Tao; Piner Richard D; Wu Zilong; Li Wei; Lee Alviff L; Carlson Matthew C; Maher Michael J; Akinwande Deji; Ellison Christopher J

来源：Polymer, 2017, 110: 131-138.

DOI：10.1016/j.polymer.2016.12.034

• Graphene
• Nanoribbon
• Block copolymer

Patterning graphene into nanoribbons (graphene nanoribbons, GNR) allows for tunability in the emerging fields of plasmonic devices in the mid-infrared and terahertz regime. However, the fabrication processes of GNR arrays for plasmonic devices often include a low-throughput electron beam lithography step that cannot be easily scaled to large areas. In this study, we developed a GNR fabrication method using block copolymer (BCP) lithography that takes advantage of the wetting transparency of graphene. One major advantage of this method is that the self-assembled domains of the polystyrene-block-poly(methyl methacrylate) BCP are oriented perpendicularly directly on top of the graphene where they can later serve as an etch mask. Large area (cm(2) scale, 3 mu m x 3 gm defect-free area) 13-51 nm wide GNR arrays were successfully fabricated using this scalable protocol. This wetting transparency-assisted GNR fabrication method could be useful for high-throughput production of various plasmonic devices, including biosensors, and photodetectors.

• 出版日期2017-2-10