摘要

Spectra of fields for applications of polymeric 3D micro/nanostructures are rapidly widening thus demanding the development of versatile precise and efficient fabrication methods that can be used to process a variety of materials and could be implemented to form tiny devices on a variety of surfaces without influencing their structural quality. We present the latest results obtained using laser lithography approach: 3D polymeric structures with submicrometer spatial resolution on different opaque surfaces such as semiconductors (Si) and various metals (Cr, Al, Fe and Ti). The photostructuring was performed using a range of photosensitive materials such as acrylate based AKRE23, acrylated biodegradable PEG-DA-258, epoxy based mr-NIL 6000, hybrid organic-inorganic SZ2080 and Ormocore b59.

  • 出版日期2013-4-1