Modification of titanium surface during its chemical etching in fluoride-containing media

作者:Dontsov M G*; Balmasov A V; Balukova A A; Nevskii O I
来源:Protection of Metals, 2007, 43(3): 285-287.
DOI:10.1134/S0033173207030149

摘要

The effects of solution composition on the electrical and other physical properties of surface films formed during the titanium chemical etching in fluoride-containing media are studied. It is shown that the formation of resistive oxide films results in the surface leveling and an increase in its reflectivity.