Microdose and Breakdown Effects Induced by Heavy Ions on Sub 32-nm Triple-Gate SOI FETs

作者:Griffoni Alessio*; Gerardin Simone; Meneghesso Gaudenzio; Paccagnella Alessandro; Simoen Eddy; Put Sofie; Claeys Cor
来源:IEEE Transactions on Nuclear Science, 2008, 55(6): 3182-3188.
DOI:10.1109/TNS.2008.2007234

摘要

We studied the permanent effects of heavy-ion strikes on decananometer triple-gate SOI devices. We highlighted the role of the geometry and the three-dimensional architecture in the response to heavy ions. Heavy-ion strikes in state-of-the-art Mriple-Gate FETs may have measurable permanent effects, due to microdose in the buried oxide, breakdown of the gate oxide, or interface state generation in the side oxide/body interface. This last effect is particularly interesting since it is related to the verticality of multigate transistors.

  • 出版日期2008-12