Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates

作者:Oujja M; Psilodimitrakopoulos S; Carrasco E; Sanz M; Philippidis A; Selimis A; Pouli P; Filippidis G; Castillejo M
来源:Physical Chemistry Chemical Physics, 2017, 19(34): 22836-22843.
DOI:10.1039/c7cp02509b

摘要

Nonlinear optical microscopy imaging serves to characterize the in-depth morphological and photochemical modifications induced by pulsed UV laser removal of dammar varnish applied on a photosensitive substrate.

  • 出版日期2017-9-14