Al-Mg-B thin films prepared by magnetron sputtering

作者：Wu, Zhanling; Bai, Yizhen^*; Qu, Wenchao; Wu, Aimin; Zhang, Dong; Zhao, Jijun; Jiang, Xin

来源：Vacuum, 2010, 85(4): 541-545.

DOI：10.1016/j.vacuum.2010.09.004

• Al-Mg-B thin films
• Magnetron sputtering
• Boron sputtering power
• Substrate temperature

Hard, nanocomposite aluminum magnesium boride thin films were prepared on Si (100) substrates with a three target magnetron sputtering system. The films were characterized by X-ray diffraction, atomic force microscope, electron micro-probe, Fourier transform infrared spectroscopy and nanoindentation. The results show that the maximum hardness of the as-deposited films is about 30.7 GPa and these films are all X-ray amorphous with smooth surfaces. The influences of substrate temperature and boron sputtering power on the quality of the films are discussed. From the results of this work, magnetron sputtering is a promising method to deposit Al-Mg-B thin films.

• 出版日期2010-10-21
• 单位大连理工大学