摘要

The use of implants made out of metallic materials can cause some negative effects that reduce the effectiveness of treatment of various diseases of the human circulatory system. These include, above all, blood clotting on the surface and insufficient hemocompatibility [1]. To reduce these negative effects, the formation of physical and chemical properties of the surface layer of the implants are indicated [2]. The paper proposes the use of the atomic layer deposition method to form a surface layer with participation of a suitable silicon morphology. One of the basic criteria of hemocompatibility of implants is their corrosion resistance. Therefore, in assessing the SiO2 layer, a detailed test for resistance to corrosion by potentiodynamic and impedance studies were conducted, including the process of steam sterilization under pressure. The chemical structure of the surface layer was also evaluated. The results clearly demonstrated that the applied layer of SiO2 has better corrosion resistance when compared to the steel substrate. This reduces excessive transfer of iron, chromium, nickel and molybdenum into the blood. On the other hand, studies of the chemical composition of the depth profile showed a diffuse SiO2 layer which results in a better adhesion to the substrate.

  • 出版日期2018-5

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