摘要
This paper reports-the preparation of optimal textured structures on silicon surfaces through metal-assisted etching using gold nanoparticles (Au NPs) as catalysts in HF/H(2)O(2) solution.. The size and density of the NPs on the Si substrates were readily and rapidly determined using spectroscopic ellipsometry. We obtained uniformly textured Si layers containing cylindrical, conical, and bowl-shaped features after immersing the Au-deposited Si substrates in a mixture of HF and H(2)O(2) under various etching conditions. A textured surface possessing close-packed. pyramidal features with dimensions on the subwavelength scale exhibited the lowest reflectance (<0.5%) over the entire visible and near-IR spectrum. This low reflectance arose from the refractive index gradient of the Si surface and light trapping phenomena. We used a 3D finite-difference time domains simulation to examine the distribution of light propagating on the textured structures within the near-field regime.
- 出版日期2008-12-25