Dependency of temperature on polarization in CH4/N-2 dielectric barrier discharge plasma: A crude assumption

作者：Majumdar Abhijit^*; Ghosh Basudev; Hippler Rainer

来源：Physics of Plasmas, 2010, 17(11): 113506.

DOI：10.1063/1.3505111

We have investigated the variations of polarization (P) and the temperature (Delta T) at the electrode surfaces during the deposition of C-N layer in CH4/N-2 (1 2) dielectric barrier discharge plasma The reactive deposition process influences the surface temperature, polarization, and the value of the in situ dielectric constant We have developed a crude model that correlates the surface temperature and surface polarization with thin film properties We assume that during the thin film deposition process, the atomic mean kinetic energy is equal to the electrostatic energy stored in the electrode surface area Theoretically estimated temperature is found to agree well with the experimental results However, the l

• 出版日期2010-11