A New Class of Charge-Trap Flash Memory With Resistive Switching Mechanisms

作者：An Ho Myoung^*; Lee Eui Bok; Kim Hee Dong; Seo Yu Jeong; Kim Tae Geun

来源：IEEE Transactions on Electron Devices, 2010, 57(10): 2398-2404.

DOI：10.1109/TED.2010.2063706

• Charge-trap Flash (CTF)
• resistive random access memory (ReRAM)
• resistive switching
• silicon/oxide/nitride/oxide/silicon (SONOS)
• universal memory

This paper presents a new class of charge-trap Flash memory device with resistive switching mechanisms. We propose a fused memory scheme using a structure of metal/Pr(0.7) Ca(0.3) MnO(3) (PCMO)/nitride/oxide/silicon to graft fast-switching features of resistive random access memory onto high-density silicon/oxide/nitride/oxide/silicon memory structures. In this scheme, both program and erase (P/E) are performed by the conduction of the carriers that are injected from the gate into the nitride layer through the PCMO, which is a resistive switching material; the resistance state determines whether a program or erase function is performed. In the proposed memory devices, we observed improved memory characteristics, including the current-voltage hysteresis having a resistive ratio exceeding three orders of magnitude at a set voltage of +/- 4.5 V, a memory window of 2.3 V, a P/E speed of 100 ns/1 ms, data retention of ten years, and endurance of 10(5) P/E cycles. This approach will offer critical clues about how one can best implement universal features of nonvolatile memories in a single chip.

• 出版日期2010-10